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Sputtering

O LaTES possui um equipamento de Sputtering modelo Three Head da Zhengzhou CY Scientific Instrument Co., Ltd.

Agendamento Sputtering

Agendamento Sputtering

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Three target magnetron sputtering coater technical parameters：

Working Voltage
  • VAC 220, 60Hz
Sputtering Vacuum Chamber
  • Dimension: ~ φ325xH510mm
  • Material: 304 stainless steel
  • Inner wall processing: electrolytic polishing
  • Sealing method: Fluorine rubber seal
  • Viewport (window): ~4” (100mm) with shutter
Sample Holder
  • Center bottom setting sample holder,   with one shutter
  • Sample holder: Dia. 150mm
  • Rotary speed: 0~20rpm adjustable
  • Heating temperature: RT~   500oC
Magnetron Sputtering Gun
  • Quantity: 3 sets
  • Adjustable angle -45°~45°
  • Sputtering orientation downwards
  • Target dimension:   diameter 2”, thickness max.3mm
Quartz   Crystal Monitor
  • Channel numbers: One-channel
  • Accuracy: 0.1Ã
  • Measurement speed: 100mS-1S adjustable
  • Measurement range: 500 000Ã (Aluminum as a reference)
  • Standard sensor quartz crystal: 6MHz
Vacuum   System Backing Pump
  • Double-stage rotary vane pump
  • Pumping rate:   1.1L/s
Molecular Pump
  • Pumping rate: 600 L/s
  • Rated rotating speed: 27000rpm
  • Starting time: <5min
  • Cooling method: water cooling
  • Vacuum degree:   5*10-4Pa
Composite Vacuum Gauge
  • Resistance   gauge + ionization gauge
  • Measuring   range: 10-5Pa ~ 105 Pa
DC Power Supply l Quantity: 2 sets

l Output power: 0~500W

l Output voltage: 0～600V

l Maximum output current: 1A

l Starting time: 1~10s
RF power supply l Quantity: 1 set

l Output power: 0~500W

l RF frequency: 13.56 MHz

l Matching method: automatch

l Reflected power: ≦100W

l Power stability: ±0.1%
Mass Flow Controller l One-channel MFC for Ar gas

l Measuring range: 0~200sccm
Water Cooler l Flow rate: 10L/min

l Power: 0.1KW

l Cooling power: 50W/℃

l Tank capacity: 9L
Control l PLC automatic control
Transition chamber l The chamber size will be for max. 4inch wafers.

l Equipped with one compact molecular pump group

l Backing pump: VRD-4, pumping speed: 1.1L/s

l Model of molecular pump: TG60F

l Pumping speed of molecular pump: 60L/s
  • Cobalto – Pureza 99,95%, Diâmetro 50,8mm – Espessura 1,5mm
  • Níquel – Pureza 99,995%, Diâmetro 50,8mm – Espessura 1,5mm
  • Ferro – Pureza 99,95%, Diâmetro 50,8mm – Espessura 1,5mm
  • Tântalo – Pureza 99,99%, Diâmetro 50,8mm – Espessura 3,0mm
  • Cobre – Pureza 99,9999%, Diâmetro 50,8mm – Espessura 3,0mm
  • Prata – Pureza 99,99%, Diâmetro 50,8mm – Espessura 3,0mm
  • Zinco – Pureza 99,99%, Diâmetro 50,8mm – Espessura 3,0mm
  • Titânio – Pureza 99,8%, Diâmetro 50,8mm – Espessura 3,0mm
  • Silício – Pureza 99,8%, Diâmetro 50,8mm – Espessura 3,0mm