{"id":118,"date":"2024-11-28T08:58:57","date_gmt":"2024-11-28T12:58:57","guid":{"rendered":"https:\/\/sish2-infi.ufms.br\/?page_id=118"},"modified":"2026-04-17T17:24:11","modified_gmt":"2026-04-17T21:24:11","slug":"sputtering","status":"publish","type":"page","link":"https:\/\/sish2-infi.ufms.br\/en\/sputtering\/","title":{"rendered":"Sputtering"},"content":{"rendered":"O LaTES possui um equipamento de Sputtering modelo Three Head da Zhengzhou CY Scientific Instrument Co., Ltd.<\/p>\n

DEtalhes da m\u00e1quina:<\/p>\n

Three target magnetron sputtering coater technical parameters\uff1a<\/strong><\/h4>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
Working Voltage<\/strong><\/td>\n\n
    \n
  • VAC 220, 60Hz<\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Sputtering Vacuum Chamber<\/td>\n\n
    \n
  • Dimension: ~ \u03c6325xH510mm<\/li>\n
  • Material: 304 stainless steel<\/li>\n
  • Inner wall processing: electrolytic polishing<\/li>\n
  • Sealing method: Fluorine rubber seal<\/span><\/li>\n
  • Viewport (window): ~4<\/span>”<\/span>\u00a0(100mm) with shutter<\/span><\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Sample Holder<\/td>\n\n
    \n
  • Center bottom setting sample holder, \u00a0 with one shutter<\/li>\n
  • Sample holder: Dia. 150mm<\/span><\/li>\n
  • Rotary speed: 0~20rpm <\/span>adjustable<\/span><\/li>\n
  • Heating temperature: RT~ \u00a0 500<\/span>o<\/sup>C<\/span><\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Magnetron Sputtering Gun<\/td>\n\n
    \n
  • Quantity: 3 sets<\/li>\n
  • Adjustable angle -45\u00b0~45\u00b0<\/span><\/li>\n
  • Sputtering orientation downwards<\/span><\/li>\n
  • Target dimension: \u00a0 diameter 2<\/span>”, thickness max.3mm<\/span><\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Quartz \u00a0 Crystal Monitor<\/td>\n\n
    \n
  • Channel numbers: One-channel<\/li>\n
  • Accuracy: 0.1\u00c3<\/li>\n
  • Measurement speed: 100mS-1S adjustable<\/li>\n
  • Measurement range: 500 000\u00c3 (Aluminum as a reference)<\/li>\n
  • Standard sensor quartz crystal: 6MHz<\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Vacuum \u00a0 System<\/td>\nBacking Pump<\/td>\n\n
    \n
  • Double-stage rotary vane pump<\/li>\n
  • Pumping rate: \u00a0 1.1L\/s<\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Molecular Pump<\/td>\n\n
    \n
  • Pumping rate: 600 L\/s<\/li>\n
  • Rated rotating speed: 27000rpm<\/li>\n
  • Starting time: <5min<\/li>\n
  • Cooling method: water cooling<\/li>\n
  • Vacuum degree: \u00a0 5*10-4<\/sup>Pa<\/span><\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
Composite Vacuum Gauge<\/td>\n\n
    \n
  • Resistance \u00a0 gauge + ionization gauge<\/li>\n
  • Measuring \u00a0 range: 10-5<\/sup>Pa ~ 10<\/span>5<\/sup>\u00a0Pa<\/span><\/li>\n<\/ul>\n<\/td>\n<\/tr>\n
DC Power Supply<\/strong><\/td>\nl<\/strong>\u00a0Quantity: 2 sets<\/p>\n

l\u00a0Output power: 0~500W<\/p>\n

l\u00a0Output voltage: 0\uff5e600V<\/p>\n

l\u00a0Maximum output current: 1A<\/p>\n

l\u00a0Starting time: 1~10s<\/td>\n<\/tr>\n

RF power supply<\/strong><\/td>\nl\u00a0<\/strong>Quantity: 1 set<\/strong><\/p>\n

l\u00a0<\/strong>Output power: 0~500W<\/strong><\/p>\n

l\u00a0<\/strong>RF frequency: 13.56 MHz<\/strong><\/p>\n

l\u00a0<\/strong>Matching method:\u00a0automatch<\/strong><\/p>\n

l\u00a0<\/strong>Reflected power: \u2266100W<\/strong><\/p>\n

l\u00a0<\/strong>Power stability: \u00b10.1%<\/strong><\/td>\n<\/tr>\n

Mass Flow Controller<\/strong><\/td>\nl\u00a0<\/strong>One-channel MFC for Ar gas<\/strong><\/p>\n

l\u00a0Measuring range: 0~200sccm<\/td>\n<\/tr>\n

Water Cooler<\/strong><\/td>\nl\u00a0Flow rate: 10L\/min<\/p>\n

l\u00a0Power: 0.1KW<\/p>\n

l\u00a0Cooling power: 50W\/\u2103<\/p>\n

l\u00a0Tank capacity: 9L<\/td>\n<\/tr>\n

Control<\/td>\nl\u00a0PLC automatic control<\/td>\n<\/tr>\n
Transition chamber<\/strong><\/td>\nl\u00a0<\/strong>The chamber size will be for max. 4inch wafers.<\/strong><\/p>\n

l\u00a0<\/strong>Equipped with one compact molecular pump group<\/strong><\/p>\n

l\u00a0<\/strong>Backing pump: VRD-4, pumping speed: 1.1L\/s<\/strong><\/p>\n

l\u00a0<\/strong>Model of molecular pump: TG60F<\/strong><\/p>\n

l\u00a0Pumping speed of molecular pump: 60L\/s<\/strong><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

    \n
  • Cobalto – Pureza 99,95%, Di\u00e2metro 50,8mm – Espessura 1,5mm<\/li>\n
  • N\u00edquel – Pureza 99,995%, Di\u00e2metro 50,8mm – Espessura 1,5mm<\/li>\n
  • Ferro – Pureza 99,95%, Di\u00e2metro 50,8mm – Espessura 1,5mm<\/li>\n
  • T\u00e2ntalo – Pureza 99,99%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n
  • Cobre – Pureza 99,9999%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n
  • Prata – Pureza 99,99%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n
  • Zinco – Pureza 99,99%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n
  • Tit\u00e2nio – Pureza 99,8%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n
  • Sil\u00edcio – Pureza 99,8%, Di\u00e2metro 50,8mm – Espessura 3,0mm<\/li>\n<\/ul>","protected":false},"excerpt":{"rendered":"

    O LaTES possui um equipamento de Sputtering modelo Three Head da Zhengzhou CY Scientific Instrument Co., Ltd. DEtalhes da m\u00e1quina: Three target magnetron sputtering coater technical parameters\uff1a Working Voltage VAC 220, 60Hz Sputtering Vacuum Chamber Dimension: ~ \u03c6325xH510mm Material: 304 stainless steel Inner wall processing: electrolytic polishing Sealing method: Fluorine rubber seal Viewport (window): ~4”\u00a0(100mm) […]<\/p>\n","protected":false},"author":13371,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"coauthors":[8],"class_list":["post-118","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/pages\/118","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/users\/13371"}],"replies":[{"embeddable":true,"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/comments?post=118"}],"version-history":[{"count":2,"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/pages\/118\/revisions"}],"predecessor-version":[{"id":179,"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/pages\/118\/revisions\/179"}],"wp:attachment":[{"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/media?parent=118"}],"wp:term":[{"taxonomy":"author","embeddable":true,"href":"https:\/\/sish2-infi.ufms.br\/en\/wp-json\/wp\/v2\/coauthors?post=118"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}